301392SZSE
🚨 Material Event

Feasibility Analysis Report on the Use of Proceeds from the 2026 Issuance of A-Shares to Specific Targets

✨ AI Summary

Guangdong Huicheng Vacuum Technology Co., Ltd. plans to raise up to RMB 955 million through a private placement of A-shares. The proceeds will be primarily used to fund the industrialization of ultra-precision semiconductor and continuous PVD equipment, as well as to supplement working capital. This investment aims to enhance the company's production capacity for advanced vacuum coating technologies and strengthen its competitive position in the domestic semiconductor and high-end manufacturing sectors.

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Stock Code: 301392 Stock Abbreviation: Huicheng Vacuum

Guangdong Huicheng Vacuum Technology Co., Ltd. (No. 2, Longyuan Road, Yanyue, Dalingshan Town, Dongguan City, Guangdong Province)

2026 Feasibility Analysis Report on the Use of Proceeds from the Issuance of A-Shares to Specific Targets

August 2026

Unless otherwise specified, the meanings of abbreviations and terms in this feasibility analysis report are consistent with those in the "Guangdong Huicheng Vacuum Technology Co., Ltd. 2026 Pre-plan for the Issuance of A-Shares to Specific Targets."

I. Plan for the Use of Proceeds

The total amount of funds raised by the company through this issuance of shares to specific targets shall not exceed RMB 955,000,000 (inclusive). After deducting issuance expenses, the net proceeds are intended to be used for the following projects:

No.Project NameTotal Investment (RMB 10,000)Proposed Proceeds Investment (RMB 10,000)
1Ultra-precision semiconductor and continuous PVD equipment industrialization project76,485.3066,861.68
2Supplementing working capital28,638.3228,638.32
Total105,123.6195,500.00

Before the proceeds are received, the company may invest its own funds based on the actual progress of the projects and replace them with the proceeds after they are received. If the actual net proceeds are less than the proposed investment amount, the company will adjust and finalize the specific investment projects, priority, and investment amounts based on the actual net proceeds and project conditions. Any shortfall will be covered by the company's own funds.

II. Analysis of the Basic Situation, Necessity, and Feasibility of the Investment Projects

(I) Ultra-precision semiconductor and continuous PVD equipment industrialization project

  1. Basic situation of the project

The company's "Ultra-precision semiconductor and continuous PVD equipment industrialization project" will be implemented in the Songshan Lake High-tech Industrial Development Zone, Dongguan City, Guangdong Province. It involves building high-grade clean workshops, optimizing production layouts, and introducing automated production lines and supporting equipment to create an advanced manufacturing base for PVD equipment with higher precision. Upon completion, the project will establish independent production capabilities for PVD equipment such as ultra-precision optical coating equipment, TGV micro-via coating equipment, and continuous coating equipment. This will strengthen the company's precise control and systematic guarantee of the entire process, promote the key application of domestic PVD equipment in industries such as semiconductors, consumer electronics, automobiles, and new energy, and better meet the growing demand of the downstream market, laying a solid foundation for the company's sustainable and high-quality development.

No.Product NameProduct Introduction
1Ultra-precision optical coating equipmentRelies on PVD technologies such as magnetron sputtering, evaporation, and ion plating. In an ultra-high vacuum environment, it produces optical films with low stress, few interface defects, high density, and high uniformity, with thickness control reaching the atomic level. It meets high-precision spectral characteristics and technical requirements, mainly used for vacuum coating of ultra-precision optical components such as reflectors and lenses for semiconductor lithography equipment.
2TGV micro-via coating equipmentRelies on magnetron sputtering PVD technology. By controlling the energy and direction of incident particles, it ensures good penetration of coating materials into micro-vias, achieving uniform and complete thin film coverage inside glass holes with high aspect ratios (small diameter, large depth).
3Continuous coating equipmentAdopts a modular design, relying on PVD technology processes such as magnetron sputtering, evaporation, and ion plating. It combines multi-process modules in series with an automated transmission system to keep coating sources working continuously, achieving a full-process continuous operation from feeding to coating and discharging. It is mainly used in downstream industries such as consumer electronics, automobiles, and new energy.

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