SVG Tech Group Co., Ltd.

SVG Tech Group Co., Ltd. is a leading domestic provider of micro-nano structure products and manufacturing technology, listed on the ChiNext board of the Shenzhen Stock Exchange since 2012. The company specializes in the independent research and development of key manufacturing equipment for micro-nano optics, particularly the laser direct writing lithography machine. This foundational technology platform enables SVG Tech to offer comprehensive design, development, and manufacturing services for micro-nano optical products across various applications. The company's main business lines include public security materials, new printing materials, consumer electronics new materials, and high-end intelligent equipment. SVG Tech has developed a range of lithography and imprinting equipment that supports nanoscale and microscale manufacturing processes. Its innovative products are utilized in diverse industries, including photovoltaics, virtual and augmented reality, and consumer electronics. By maintaining a focus on original innovation and the development of core technologies, the company has established a fully integrated innovation capability, allowing it to respond rapidly to market demands and provide customized technical services from initial design to finished products.

The company has long adhered to original innovative research. Through years of research and development in the field of micro-nano optical manufacturing, it has accumulated a number of core technologies with independent intellectual property rights. Based on its research on lithography equipment control software, it has designed and developed a series of professional lithography and image processing software. The company possesses the full-chain technical capability for micro-nano optics, encompassing optical graphic design, self-development of various lithography equipment including laser direct writing lithography and self-made molds, and self-development of nanoimprint lithography equipment for batch replication. This allows for rapid response to market demands and technological iterations, enabling the company to provide clients with customized technical services from initial design to finished products. Driven by key technology research, the company promotes product development and is committed to the industrial application of scientific and technological achievements and core technologies. It has successfully developed several national key new products and received numerous provincial and ministerial-level honors. The company's technological R&D capabilities are reflected not only in the development of high-end industry products but also in the development of critical industry equipment. The equipment used in each core aspect of the production process possesses independent intellectual property rights. By independently developing "high-throughput micro-nano process equipment," the company has established a fully integrated innovation capability encompassing micro-nano structure design, key process equipment, and material/device applications. This has created a functional innovation platform for micro-nano manufacturing that is "modular, knowledge-intensive, upgradable, and rapidly configurable," driving and realizing flexible manufacturing and industrial application of products. Lithography equipment constitutes one of the company's primary strategic development directions for future business. The company will continue to promote the application of various types of lithography equipment across different industries and fields. It will focus on expanding the application of direct-write lithography in areas such as semiconductor mask plates. It will prioritize exploring the application of nanoimprint lithography in microfluidics, biochips, and integrated circuit manufacturing. It will actively promote the application of projection scan lithography equipment in fields such as IC substrates, packaging, and photovoltaic copper electroplating patterning. Furthermore, it will actively explore and develop lithography-related technologies for applications like high-process node masks.